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Directed Growth of Electroactive Metal‐Organic Framework Thin Films Using Electrophoretic Deposition
Author(s) -
Hod Idan,
Bury Wojciech,
Karlin David M.,
Deria Pravas,
Kung ChungWei,
Katz Michael J.,
So Monica,
Klahr Benjamin,
Jin Danni,
Chung YipWah,
Odom Teri W.,
Farha Omar K.,
Hupp Joseph T.
Publication year - 2014
Publication title -
advanced materials
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 10.707
H-Index - 527
eISSN - 1521-4095
pISSN - 0935-9648
DOI - 10.1002/adma.201401940
Subject(s) - electrophoretic deposition , materials science , deposition (geology) , thin film , electrochemistry , chemical engineering , metal organic framework , nanotechnology , electrophoresis , metal , flexibility (engineering) , metallurgy , electrode , organic chemistry , chromatography , chemistry , paleontology , statistics , mathematics , adsorption , sediment , engineering , biology , coating
Electrophoretic deposition (EPD) is used to assemble metal–organic framework (MOF) materials in nano‐ and micro‐particulate, thin‐film form. The flexibility of the method is demonstrated by the successful deposition of 4 types of MOFs: NU‐1000, UiO‐66, HKUST‐1, and Al‐MIL‐53. Additionally, EPD is used to pattern the growth of NU‐1000 thin films that exhibit full electrochemical activity.