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Metal‐Organic Frameworks: Combining UV Lithography and an Imprinting Technique for Patterning Metal‐Organic Frameworks (Adv. Mater. 34/2013)
Author(s) -
Doherty Cara M.,
Grenci Gianluca,
Riccò Raffaele,
Mardel James I.,
Reboul Julien,
Furukawa Shuhei,
Kitagawa Susumu,
Hill Anita J.,
Falcaro Paolo
Publication year - 2013
Publication title -
advanced materials
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 10.707
H-Index - 527
eISSN - 1521-4095
pISSN - 0935-9648
DOI - 10.1002/adma.201370212
Subject(s) - materials science , photolithography , nanotechnology , lithography , fabrication , molecular imprinting , imprinting (psychology) , metal organic framework , metal , optoelectronics , organic chemistry , catalysis , selectivity , chemistry , metallurgy , medicine , biochemistry , alternative medicine , pathology , adsorption , gene
Patterning metal‐organic frameworks (MOFs) using cheap, fast, and versatile methods is a key enabling technology for multifunctional miniaturized device fabrication. A collaborative work led by Paolo Falcaro (CSIRO ‐ Australia) demonstrates on page 4701 how a combination of existing lithographic approaches, such as photolithography and imprinting, can be efficiently used for positioning different already‐prepared ultraporous crystals. Cover Image by Paolo Falcaro.