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Thin Films: Organic Vapor Passivation of Silicon at Room Temperature (Adv. Mater. 14/2013)
Author(s) -
Yang Rong,
Buonassisi Tonio,
Gleason Karen K.
Publication year - 2013
Publication title -
advanced materials
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 10.707
H-Index - 527
eISSN - 1521-4095
pISSN - 0935-9648
DOI - 10.1002/adma.201370092
Subject(s) - passivation , materials science , silicon , chemical vapor deposition , layer (electronics) , radical , thin film , chemical engineering , optoelectronics , coating , nanotechnology , organic chemistry , chemistry , engineering
Initiated chemical vapor deposition is used to achieve air‐stable organic passivation of silicon, as reported by Karen K. Gleason and co‐workers on page 2078 . This layer also functions as an anti‐reflection coating. Resistively heated wires produce reactive gas phase species, including methyl radicals, while the silicon surface below remains near room temperature. Photoshop enhanced image by Felice C. Frankel.