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Long‐Range Ordered Self‐Assembly of Novel Acrylamide‐Based Diblock Copolymers for Nanolithography and Metallic Nanostructure Fabrication
Author(s) -
Lee Je Gwon,
Jung Yeon Sik,
Han SungHwan,
Kim KwanMook,
Han YangKyoo
Publication year - 2014
Publication title -
advanced materials
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 10.707
H-Index - 527
eISSN - 1521-4095
pISSN - 0935-9648
DOI - 10.1002/adma.201305186
Subject(s) - materials science , copolymer , nanostructure , nanotechnology , nanolithography , fabrication , nanowire , self assembly , substrate (aquarium) , polymer , medicine , oceanography , alternative medicine , pathology , geology , composite material
Novel acrylamide‐based hard‐soft hybrid block copolymers generate high‐quality nanolithographic patterns satisfying high‐resolution, long‐range ordering, low defect density, moderate etch selectivity, and easy pattern transfer onto a substrate. The resulting patterns can also be used as a scaffold for metallic nanostructures such as aligned nanowires and nanomeshes with extraordinary structural regularity.