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Complex Dynamic Substrate Control: Dual‐Tone Hydrogel Photoresists Allow Double‐Dissociation of Topography and Modulus
Author(s) -
Xue Changying,
Wong Darice Y.,
Kasko Andrea M.
Publication year - 2014
Publication title -
advanced materials
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 10.707
H-Index - 527
eISSN - 1521-4095
pISSN - 0935-9648
DOI - 10.1002/adma.201304591
Subject(s) - computer science , artificial intelligence , materials science
Complex substrate control is demonstrated with a dual‐tone hydrogel photoresist. By exposing a photodegradable hydrogel to UV light through a photomask, both swollen and eroded micropatterns with a decreased modulus can be created on the surface under different exposure conditions. This provides an important tool for investigating the synergistic effects of spatially heterogeneous mechanical and topological cues on cell behavior.