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Fabrication of Silicon Nanowire Arrays by Macroscopic Galvanic Cell‐Driven Metal Catalyzed Electroless Etching in Aerated HF Solution
Author(s) -
Liu Lin,
Peng KuiQing,
Hu Ya,
Wu XiaoLing,
Lee ShuitTong
Publication year - 2014
Publication title -
advanced materials
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 10.707
H-Index - 527
eISSN - 1521-4095
pISSN - 0935-9648
DOI - 10.1002/adma.201304327
Subject(s) - materials science , etching (microfabrication) , galvanic cell , silicon , hydrofluoric acid , nanotechnology , nanowire , oxidizing agent , substrate (aquarium) , graphite , metal , metallurgy , organic chemistry , chemistry , oceanography , layer (electronics) , geology
Macroscopic galvanic cell‐driven metal catalyzed electroless etching (MCEE) of silicon in aqueous hydrofluoric acid (HF) solution is devised to fabricate silicon nanowire (SiNW) arrays with dissolved oxygen acting as the one and only oxidizing agent. The key aspect of this strategy is the use of a graphite or other noble metal electrode that is electrically coupled with silicon substrate.