Premium
Novel Hybrid Organic‐Inorganic Spin‐on Resist for Electron‐ or Photon‐Based Nanolithography with Outstanding Resistance to Dry Etching
Author(s) -
Zanchetta Erika,
Giustina Gioia Della,
Grenci Gianluca,
Pozzato Alessandro,
Tormen Massimo,
Brusatin Giovanna
Publication year - 2014
Publication title -
advanced materials
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 10.707
H-Index - 527
eISSN - 1521-4095
pISSN - 0935-9648
DOI - 10.1002/adma.201303707
Subject(s) - resist , nanolithography , etching (microfabrication) , materials science , dry etching , nanotechnology , lithography , optoelectronics , fabrication , medicine , alternative medicine , layer (electronics) , pathology
Accelerating Research
Robert Robinson Avenue,
Oxford Science Park, Oxford
OX4 4GP, United Kingdom
Address
John Eccles HouseRobert Robinson Avenue,
Oxford Science Park, Oxford
OX4 4GP, United Kingdom