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Photo–Roll Lithography (PRL) for Continuous and Scalable Patterning with Application in Flexible Electronics
Author(s) -
Ok Jong G.,
Kwak Moon Kyu,
Huard Chad M.,
Youn Hong Seok,
Guo L. Jay
Publication year - 2013
Publication title -
advanced materials
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 10.707
H-Index - 527
eISSN - 1521-4095
pISSN - 0935-9648
DOI - 10.1002/adma.201303514
Subject(s) - photolithography , lithography , nanolithography , materials science , fabrication , nanotechnology , computational lithography , substrate (aquarium) , roll to roll processing , nanoimprint lithography , next generation lithography , x ray lithography , optoelectronics , stencil lithography , resist , electron beam lithography , medicine , oceanography , alternative medicine , pathology , layer (electronics) , geology
A novel nanofabrication methodology for continuous, scalable, and geometry‐tunable lithography is developed, named photo–roll lithography (PRL), by integrating photolithography with rollable processing. As a flexible mask attached to a quartz cylinder containing a UV source rolls over a photoresistcoated substrate, PRL realizes continuous photolithographic fabrication of various micro/nanoscale patterns with geometry that is tunable by controlling mask–substrate motions.