Photo–Roll Lithography (PRL) for Continuous and Scalable Patterning with Application in Flexible Electronics | Zendy

Ok Jong G. | Zendy; Kwak Moon Kyu | Zendy; Huard Chad M. | Zendy; Youn Hong Seok | Zendy; Guo L. Jay | Zendy

AI Assistant Blog Pricing

Home ZAIA Blog

Premium

Photo–Roll Lithography (PRL) for Continuous and Scalable Patterning with Application in Flexible Electronics

Author(s) -

Ok Jong G.,

Kwak Moon Kyu,

Huard Chad M.,

Youn Hong Seok,

Guo L. Jay

Publication year - 2013

Publication title -

advanced materials

Language(s) - English

Resource type - Journals

SCImago Journal Rank - 10.707

H-Index - 527

eISSN - 1521-4095

pISSN - 0935-9648

DOI - 10.1002/adma.201303514

Subject(s) - photolithography , lithography , nanolithography , materials science , fabrication , nanotechnology , computational lithography , substrate (aquarium) , roll to roll processing , nanoimprint lithography , next generation lithography , x ray lithography , optoelectronics , stencil lithography , resist , electron beam lithography , medicine , oceanography , alternative medicine , pathology , layer (electronics) , geology

A novel nanofabrication methodology for continuous, scalable, and geometry‐tunable lithography is developed, named photo–roll lithography (PRL), by integrating photolithography with rollable processing. As a flexible mask attached to a quartz cylinder containing a UV source rolls over a photoresistcoated substrate, PRL realizes continuous photolithographic fabrication of various micro/nanoscale patterns with geometry that is tunable by controlling mask–substrate motions.

This content is not available in your region!

Continue researching here.

Having issues? You can contact us here

Accelerating Research