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Metal‐Containing Block Copolymer Thin Films Yield Wire Grid Polarizers with High Aspect Ratio
Author(s) -
Kim So Youn,
Gwyther Jessica,
Manners Ian,
Chaikin Paul M.,
Register Richard A.
Publication year - 2014
Publication title -
advanced materials
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 10.707
H-Index - 527
eISSN - 1521-4095
pISSN - 0935-9648
DOI - 10.1002/adma.201303452
Subject(s) - materials science , copolymer , polarizer , amorphous solid , polystyrene , template , yield (engineering) , thin film , aspect ratio (aeronautics) , silicon , nanowire , nanotechnology , optoelectronics , composite material , polymer , optics , crystallography , chemistry , physics , birefringence
Highly selective etch masks are formed by thin films of a polystyrene‐ b ‐poly(ferrocenylisopropylmethylsilane) diblock copolymer, PS‐PFiPMS, containing hemicylindrical domains of PFiPMS. These domains, with a period of 35 nm, are readily aligned through mechanical shear. Aligned PS‐PFiPMS templates are employed to fabricate high‐aspect‐ratio nanowire grids from amorphous silicon, which can polarize deep ultraviolet radiation, including 193 nm, at >90% efficiency.