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A Simple Method for Cleaning Graphene Surfaces with an Electrostatic Force
Author(s) -
Choi Won Jin,
Chung Yoon Jang,
Park Serin,
Yang CheolSoo,
Lee Young Kuk,
An KiSeok,
Lee YouSeop,
Lee JeongO
Publication year - 2014
Publication title -
advanced materials
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 10.707
H-Index - 527
eISSN - 1521-4095
pISSN - 0935-9648
DOI - 10.1002/adma.201303199
Subject(s) - graphene , chemical vapor deposition , materials science , simple (philosophy) , nanotechnology , epistemology , philosophy
A facile method involving electrostatic forces is used to clean graphene surfaces that have been prepared through chemical vapor deposition (CVD). In this electrostatic‐force cleaning (EFC) method, extremely fine cloth fibers are rubbed against CVD‐grown graphene, in order to remove residual poly(methyl methacrylate) (PMMA), known as "PMMA‐G," without damaging the graphene surface.