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Precise Patterning of Silk Microstructures Using Photolithography
Author(s) -
Kurland Nicholas E.,
Dey Tuli,
Kundu Subhas C.,
Yadavalli Vamsi K.
Publication year - 2013
Publication title -
advanced materials
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 10.707
H-Index - 527
eISSN - 1521-4095
pISSN - 0935-9648
DOI - 10.1002/adma.201302823
Subject(s) - photoresist , photolithography , fibroin , nanotechnology , materials science , silk , lithography , computer science , optoelectronics , layer (electronics) , composite material
Photolithography is used in conjunction with a “silk fibroin photoresist” to form precise protein microstructures directly and rapidly on a variety of substrates. High‐resolution features in two and three dimensions with line widths down to one micrometer are formed. Photo‐crosslinked protein structures guide cell adhesion, providing precise spatial control of cells without requiring adhesive ligands.