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Non‐Porous Low‐ k Dielectric Films Based on a New Structural Amorphous Fluoropolymer
Author(s) -
Yuan Chao,
Jin Kaikai,
Li Kai,
Diao Shen,
Tong Jiawei,
Fang Qiang
Publication year - 2013
Publication title -
advanced materials
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 10.707
H-Index - 527
eISSN - 1521-4095
pISSN - 0935-9648
DOI - 10.1002/adma.201302021
Subject(s) - fluoropolymer , dielectric , amorphous solid , thermostability , materials science , porosity , low k dielectric , nanotechnology , composite material , crystallography , optoelectronics , polymer , nuclear magnetic resonance , physics , chemistry , enzyme
A non‐porous and amorphous fluoropolymer PFN with low dielectric constant of 2.33 and dielectric loss less than 1.2 × 10 −3 is reported here. PFN also exhibits good mechanical properties and high thermostability. This study is a new example of a fully dense material showing a low k value and having good thermo/mechanical properties.
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