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Combining UV Lithography and an Imprinting Technique for Patterning Metal‐Organic Frameworks
Author(s) -
Doherty Cara M.,
Grenci Gianluca,
Riccò Raffaele,
Mardel James I.,
Reboul Julien,
Furukawa Shuhei,
Kitagawa Susumu,
Hill Anita J.,
Falcaro Paolo
Publication year - 2013
Publication title -
advanced materials
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 10.707
H-Index - 527
eISSN - 1521-4095
pISSN - 0935-9648
DOI - 10.1002/adma.201301383
Subject(s) - materials science , imprinting (psychology) , nanotechnology , lithography , metal organic framework , molecular imprinting , soft lithography , metal , optoelectronics , fabrication , catalysis , organic chemistry , metallurgy , selectivity , medicine , biochemistry , chemistry , alternative medicine , pathology , gene , adsorption
Thin metal‐organic framework (MOF) films are patterned using UV lithography and an imprinting technique. A UV lithographed SU‐8 film is imprinted onto a film of MOF powder forming a 2D MOF patterned film. This straightforward method can be applied to most MOF materials, is versatile, cheap, and potentially useful for commercial applications such as lab‐on‐a‐chip type devices.