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Solvent‐Assisted Directed Self‐Assembly of Spherical Microdomain Block Copolymers to High Areal Density Arrays
Author(s) -
Gu Weiyin,
Xu Ji,
Kim JungKeun,
Hong Sung Woo,
Wei Xinyu,
Yang Xiaomin,
Lee Kim Y.,
Kuo David S.,
Xiao Shuaigang,
Russell Thomas P.
Publication year - 2013
Publication title -
advanced materials
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 10.707
H-Index - 527
eISSN - 1521-4095
pISSN - 0935-9648
DOI - 10.1002/adma.201300899
Subject(s) - materials science , polydimethylsiloxane , copolymer , solvent , polystyrene , self assembly , annealing (glass) , fabrication , chemical engineering , nanotechnology , polymer chemistry , organic chemistry , composite material , polymer , chemistry , medicine , alternative medicine , pathology , engineering
The fabrication process for 5 Tb/in 2 bit patterns using solvent‐assisted directed self‐assembly is investigated. The N ‐methyl‐2‐pyrrolidone solvent vapor‐annealing method was used to achieve good long‐range lateral ordering of low‐molecular‐weight polystyrene‐ block ‐polydimethylsiloxane with a lattice spacing of 11 nm on flat Si substrates, PS modified substrates and lithographically patterned substrates, respectively.