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Topographic Templating: Rectangular Symmetry Morphologies in a Topographically Templated Block Copolymer (Adv. Mater. 31/2012)
Author(s) -
Tavakkoli K. G. Amir,
Han Adam F.,
Gotrik Kevin W.,
AlexanderKatz Alfredo,
Ross Caroline A.,
Berggren Karl K.
Publication year - 2012
Publication title -
advanced materials
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 10.707
H-Index - 527
eISSN - 1521-4095
pISSN - 0935-9648
DOI - 10.1002/adma.201290190
Subject(s) - copolymer , materials science , square lattice , square (algebra) , self assembly , lattice (music) , block (permutation group theory) , nanotechnology , optics , combinatorics , condensed matter physics , geometry , composite material , physics , polymer , mathematics , acoustics , ising model
By functionalizing lithographically defined posts with a brush consisting of the majority block of a block copolymer, various morphologies can be formed in a templated self‐assembled pattern, as reported by K. K. Berggren, C. A. Ross, and co‐workers on page 4249 . In the cover image, square‐symmetric post arrays produce a similarly square‐symmetric microdomain lattice, coincidentally doubling the pattern density.