Topographic Templating: Rectangular Symmetry Morphologies in a Topographically Templated Block Copolymer (Adv. Mater. 31/2012) | Zendy

Tavakkoli K. G. Amir | Zendy; Han Adam F. | Zendy; Gotrik Kevin W. | Zendy; AlexanderKatz Alfredo | Zendy; Ross Caroline A. | Zendy; Berggren Karl K. | Zendy

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Topographic Templating: Rectangular Symmetry Morphologies in a Topographically Templated Block Copolymer (Adv. Mater. 31/2012)

Author(s) -

Tavakkoli K. G. Amir,

Han Adam F.,

Gotrik Kevin W.,

AlexanderKatz Alfredo,

Ross Caroline A.,

Berggren Karl K.

Publication year - 2012

Publication title -

advanced materials

Language(s) - English

Resource type - Journals

SCImago Journal Rank - 10.707

H-Index - 527

eISSN - 1521-4095

pISSN - 0935-9648

DOI - 10.1002/adma.201290190

Subject(s) - copolymer , materials science , square lattice , square (algebra) , self assembly , lattice (music) , block (permutation group theory) , nanotechnology , optics , combinatorics , condensed matter physics , geometry , composite material , physics , polymer , mathematics , acoustics , ising model

By functionalizing lithographically defined posts with a brush consisting of the majority block of a block copolymer, various morphologies can be formed in a templated self‐assembled pattern, as reported by K. K. Berggren, C. A. Ross, and co‐workers on page 4249 . In the cover image, square‐symmetric post arrays produce a similarly square‐symmetric microdomain lattice, coincidentally doubling the pattern density.

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