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Template Patterning: Flexible Control of Block Copolymer Directed Self‐Assembly using Small, Topographical Templates: Potential Lithography Solution for Integrated Circuit Contact Hole Patterning (Adv. Mater. 23/2012)
Author(s) -
Yi He,
Bao XinYu,
Zhang Jie,
Bencher Christopher,
Chang LiWen,
Chen Xiangyu,
Tiberio Richard,
Conway James,
Dai Huixiong,
Chen Yongmei,
Mitra Subhasish,
Wong H.S. Philip
Publication year - 2012
Publication title -
advanced materials
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 10.707
H-Index - 527
eISSN - 1521-4095
pISSN - 0935-9648
DOI - 10.1002/adma.201290134
Subject(s) - template , copolymer , materials science , lithography , nanotechnology , self assembly , block (permutation group theory) , optoelectronics , polymer , composite material , geometry , mathematics
The image depicts the flexible control over the directed self‐assembly of block copolymers that can be achieved using small topographical templates. On page 3107 , H.‐S. P. Wong and co‐workers explain how differently shaped templates cause the block copolymer to self‐assemble to form corresponding nanopatterns, providing a potential solution to contact‐hole patterning for integrated circuits beyond the 22 nm technology node.