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Photofluidization: Directional Photofluidization Lithography: Micro/Nanostructural Evolution by Photofluidic Motions of Azobenzene Materials (Adv. Mater. 16/2012)
Author(s) -
Lee Seungwoo,
Kang Hong Suk,
Park JungKi
Publication year - 2012
Publication title -
advanced materials
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 10.707
H-Index - 527
eISSN - 1521-4095
pISSN - 0935-9648
DOI - 10.1002/adma.201290090
Subject(s) - materials science , lithography , azobenzene , nanotechnology , nanostructure , enhanced data rates for gsm evolution , optoelectronics , polymer , composite material , telecommunications , computer science
On page 2069 , S. Lee, J.‐K. Park, and co‐workers review progress in micro/nanostructural evolution by the directional photofluidization of azo‐materials (collectively known as directional photofluidization lithography). These materials are nearly impossible to obtain with other existing lithographic methods. Azo‐materials become fluidized when irradiated, in a manner such that structural defects such as line‐edge roughness are greatly reduced. More importantly, the unique characteristics of the directionality of such photofluidization provide unprecedented ways for the deterministic and large‐area shaping of micro/nanostructures.