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Transparent Conductive Gas‐Permeation Barriers on Plastics by Atomic Layer Deposition
Author(s) -
Chou ChunTing,
Yu PeiWei,
Tseng MingHung,
Hsu CheChen,
Shyue JingJong,
Wang ChingChiun,
Tsai FengYu
Publication year - 2013
Publication title -
advanced materials
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 10.707
H-Index - 527
eISSN - 1521-4095
pISSN - 0935-9648
DOI - 10.1002/adma.201204358
Subject(s) - materials science , dopant , electrical resistivity and conductivity , atomic layer deposition , permeation , layer (electronics) , electrical conductor , deposition (geology) , chemical vapor deposition , chemical engineering , moisture , conductivity , nanotechnology , composite material , optoelectronics , doping , membrane , chemistry , paleontology , sediment , biology , electrical engineering , genetics , engineering
A mixed‐deposition atomic layer deposition process produces Hf:ZnO films with uniform dopant distribution and high electrical conductivity (resistivity = 4.5 × 10 −4 W cm), optical transparency (>85% from 400–1800 nm), and moisture‐barrier property (water vapor transmission rate = 6.3 × 10 −6 g m −2 day −1 ).
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