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Ultralow Reflection from a ‐Si Nanograss/Si Nanofrustum Double Layers
Author(s) -
Ravipati Srikanth,
Shieh Jiann,
Ko FuHsiang,
Yu ChenChieh,
Chen HsuenLi
Publication year - 2013
Publication title -
advanced materials
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 10.707
H-Index - 527
eISSN - 1521-4095
pISSN - 0935-9648
DOI - 10.1002/adma.201204235
Subject(s) - materials science , nanostructure , reflection (computer programming) , amorphous solid , substrate (aquarium) , refractive index , layer (electronics) , optoelectronics , absorption (acoustics) , silicon , nanotechnology , optics , computer science , crystallography , physics , chemistry , oceanography , geology , programming language , composite material
A double‐layer nanostructure comprising amorphous Si nanograss on top of Si nanofrustums (NFs) with a total height of 680 nm exhibits ultralow reflection. Almost near‐unity absorption and near‐zero reflectance result in this layered nanostructure, over a broad range of wavelengths and a wide range of angles of incidence, due to the low packing density of a ‐Si and the smooth transition of the refractive index from the air to the Si substrate across both the nanograss and NF layers.