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Polymerization Inhibition by Triplet State Absorption for Nanoscale Lithography
Author(s) -
Harke Benjamin,
Dallari William,
Grancini Giulia,
Fazzi Daniele,
Brandi Fernando,
Petrozza Annamaria,
Diaspro Alberto
Publication year - 2013
Publication title -
advanced materials
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 10.707
H-Index - 527
eISSN - 1521-4095
pISSN - 0935-9648
DOI - 10.1002/adma.201204141
Subject(s) - materials science , lithography , polymerization , nanoscopic scale , absorption (acoustics) , nanotechnology , photochemistry , polymer , optoelectronics , composite material , chemistry
The diffraction limit in direct‐laser‐writing (DLW) lithography can be circumvented by selective inhibition of the polymerization. By combining nanosecond transient absorption spectroscopy and density functional theory it is demonstrated that polymerization inhibition is possible by a direct absorption of the lowest triplet state. Polymerization inhibition by triplet state absorption (TSA) has the potential to bring DLW lithography into the nanometer scale.