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Nanoscale Block Copolymer Ordering Induced by Visible Interferometric Micropatterning: A Route towards Large Scale Block Copolymer 2D Crystals
Author(s) -
Aissou Karim,
Shaver Jonah,
Fleury Guillaume,
Pécastaings Gilles,
Brochon Cyril,
Navarro Christophe,
Grauby Stéphane,
Rampnoux JeanMichel,
Dilhaire Stefan,
Hadziioannou Georges
Publication year - 2013
Publication title -
advanced materials
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 10.707
H-Index - 527
eISSN - 1521-4095
pISSN - 0935-9648
DOI - 10.1002/adma.201203254
Subject(s) - copolymer , materials science , azobenzene , micropatterning , nanoscopic scale , lithography , layer (electronics) , nanotechnology , holography , nanomanufacturing , nanoimprint lithography , polymer , optoelectronics , optics , composite material , fabrication , medicine , alternative medicine , pathology , physics
We have overcome the cost and time consumption limitations of common lithography techniques used to control the self‐assembly of block copolymers into highly ordered 2D arrays through the use of a guiding pattern created from a polymeric sub‐layer. The guiding pattern is a sinusoidal surface‐relief grating interferometrically inscribed onto an azobenzene containing copolymer sub‐layer leading to a defect‐free single grain of block copolymer domains.