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Single‐Step Formation of Graphene on Dielectric Surfaces
Author(s) -
Xiong Wei,
Zhou Yun Shen,
Jiang Li Jia,
Sarkar Amitabha,
MahjouriSamani Masoud,
Xie Zhi Qiang,
Gao Yang,
Ianno Natale Joseph,
Jiang Lan,
Lu Yong Feng
Publication year - 2013
Publication title -
advanced materials
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 10.707
H-Index - 527
eISSN - 1521-4095
pISSN - 0935-9648
DOI - 10.1002/adma.201202840
Subject(s) - graphene , materials science , dielectric , nanotechnology , wafer , transmittance , sheet resistance , monolayer , amorphous solid , carbon fibers , optoelectronics , composite material , layer (electronics) , chemistry , organic chemistry , composite number
The direct formation of graphene on various dielectric surfaces is successful via a single‐step rapid thermal processing (RTP) of substrates coated with amorphous carbon (C) and nickel (Ni) thin films. High‐quality graphene is obtained uniformly on the whole surface of wafers with a controlled number of graphene layers. The monolayer graphene exhibits a low sheet resistance and a high optical transmittance in the visible range.