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Nanotransfer Printing with sub‐10 nm Resolution Realized using Directed Self‐Assembly
Author(s) -
Jeong Jae Won,
Park Woon Ik,
Do LeeMi,
Park JongHyun,
Kim TaeHeon,
Chae Geesung,
Jung Yeon Sik
Publication year - 2012
Publication title -
advanced materials
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 10.707
H-Index - 527
eISSN - 1521-4095
pISSN - 0935-9648
DOI - 10.1002/adma.201200356
Subject(s) - materials science , polydimethylsiloxane , fabrication , copolymer , nanotechnology , self assembly , polymer , planar , nanostructure , composite material , medicine , alternative medicine , computer graphics (images) , pathology , computer science
An extraordinarily facile sub‐10 nm fabrication method using the synergic combination of nanotransfer printing and the directed self‐assembly of block copolymers is introduced. The approach is realized by achieving the uniform self‐assembly of polydimethylsiloxane (PDMS)‐containing block copolymers on a PDMS mold through the stabilization of the block copolymer thin films. This simple printing method can be applied on oxides, metals, polymers, and non‐planar substrates without pretreatments. The fabrication of well‐aligned metallic and polymeric functional nanostructures and crossed wire structures is also presented.