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Two‐Dimensional Polymer as a Mask for Surface Nanopatterning
Author(s) -
Clair Sylvain,
Ourdjini Oualid,
Abel Mathieu,
Porte Louis
Publication year - 2012
Publication title -
advanced materials
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 10.707
H-Index - 527
eISSN - 1521-4095
pISSN - 0935-9648
DOI - 10.1002/adma.201200063
Subject(s) - materials science , nanolithography , polymer , layer (electronics) , nanotechnology , lithography , fabrication , optoelectronics , composite material , medicine , alternative medicine , pathology
NaCl islands are used as a sacrificial layer to selectively deposit a boronic acid based two‐dimensional polymer . The nanostructured polymer layer can be used as a negative mask to create Fe islands in a nanolithography mimicking process.