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Photofluidic Nanotexturing: Deterministic Nanotexturing by Directional Photofluidization Lithography (Adv. Mater. 29/2011)
Author(s) -
Lee Seungwoo,
Shin Jonghwa,
Kang Hong Suk,
Lee YongHee,
Park JungKi
Publication year - 2011
Publication title -
advanced materials
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 10.707
H-Index - 527
eISSN - 1521-4095
pISSN - 0935-9648
DOI - 10.1002/adma.201190113
Subject(s) - materials science , nanolithography , lithography , nanotechnology , dip pen nanolithography , perspective (graphical) , photonics , optoelectronics , fabrication , computer science , artificial intelligence , alternative medicine , pathology , medicine
This colorized, perspective AFM images demonstrate stepwise directional photofluidic evolution of nanotextures with deterministically controlled structural complexity, as reported by Seungwoo Lee, Jung‐Ki Park, and co‐workers. This promising design approach shows a hidden potential of nanofabrication, greatly extending our ability to manipulate photonic and interface properties of nanotextured surfaces.