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Photopatterning: Mechanophotopatterning on a Photoresponsive Elastomer (Adv. Mater. 17/2011)
Author(s) -
Kloxin Christopher J.,
Scott Timothy F.,
Park Hee Young,
Bowman Christopher N.
Publication year - 2011
Publication title -
advanced materials
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 10.707
H-Index - 527
eISSN - 1521-4095
pISSN - 0935-9648
DOI - 10.1002/adma.201190062
Subject(s) - photomask , materials science , elastomer , backlight , square (algebra) , liquid crystal display , optics , lens (geology) , covalent bond , nanotechnology , composite material , optoelectronics , resist , geometry , mathematics , physics , layer (electronics) , quantum mechanics
Mechanophotopatterning on a photoreversible covalent adaptable network allows complex topo‐graphical features to be fabricated by performing sequential stretching and light exposure steps, report Christopher Kloxin and co‐workers on p. 1977 . In this image, the material was stretched and exposed to a square‐array photomask, followed by a second exposure to a square‐array photomask rotated 45°. The lens quality of this material is demonstrated when backlit by an LCD display.
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