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Enhancement in the Performance of Ultrathin Hematite Photoanode for Water Splitting by an Oxide Underlayer
Author(s) -
Hisatomi Takashi,
Dotan Hen,
Stefik Morgan,
Sivula Kevin,
Rothschild Avner,
Grätzel Michaël,
Mathews Nripan
Publication year - 2012
Publication title -
advanced materials
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 10.707
H-Index - 527
eISSN - 1521-4095
pISSN - 0935-9648
DOI - 10.1002/adma.201104868
Subject(s) - hematite , materials science , atomic layer deposition , oxide , water splitting , layer (electronics) , deposition (geology) , optoelectronics , chemical engineering , nanotechnology , photocatalysis , metallurgy , catalysis , paleontology , biochemistry , chemistry , sediment , engineering , biology
A 2‐nm thick Nb 2 O 5 underlayer deposited by atomic layer deposition increases the charge separation efficiency and the photovoltage of ultrathin hematite films by suppressing electron back injection. Absorbed photon‐to‐current efficiencies (APCE) as high as 40%, which are one of the highest ever reported with hematite photoanodes, are obtained at 400 nm at +1.43 V vs. RHE.