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Directional Photofluidization Lithography: Micro/Nanostructural Evolution by Photofluidic Motions of Azobenzene Materials
Author(s) -
Lee Seungwoo,
Kang Hong Suk,
Park JungKi
Publication year - 2012
Publication title -
advanced materials
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 10.707
H-Index - 527
eISSN - 1521-4095
pISSN - 0935-9648
DOI - 10.1002/adma.201104826
Subject(s) - nanolithography , nanotechnology , materials science , azobenzene , lithography , nanostructure , fabrication , nanoscopic scale , nanoimprint lithography , optoelectronics , polymer , medicine , alternative medicine , pathology , composite material
This review demonstrates directional photofluidization lithography (DPL), which makes it possible to fabricate a generic and sophisticated micro/nanoarchitecture that would be difficult or impossible to attain with other methods. In particular, DPL differs from many of the existing micro/nanofabrication methods in that the post‐treatment (i.e., photofluidization), after the preliminary fabrication process of the original micro/nanostructures, plays a pivotal role in the various micro/nanostructural evolutions including the deterministic reshaping of architectures, the reduction of structural roughness, and the dramatic enhancement of pattern resolution. Also, DPL techniques are directly compatible with a parallel and scalable micro/nanofabrication. Thus, DPL with such extraordinary advantages in micro/nanofabrication could provide compelling opportunities for basic micro/nanoscale science as well as for general technology applications.