Fine Wettability Control Created by a Photochemical Combination Method for Inkjet Printing on Self‐Assembled Monolayers | Zendy

Tsuchiya Youichi | Zendy; Haraguchi Shuichi | Zendy; Ogawa Masashi | Zendy; Shiraki Tomohiro | Zendy; Kakimoto Hidenobu | Zendy; Gotou Osamu | Zendy; Yamada Takeshi | Zendy; Okumoto Kenji | Zendy; Nakatani Shuhei | Zendy; Sakanoue Kei | Zendy; Shinkai Seiji | Zendy

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Fine Wettability Control Created by a Photochemical Combination Method for Inkjet Printing on Self‐Assembled Monolayers

Author(s) -

Tsuchiya Youichi,

Haraguchi Shuichi,

Ogawa Masashi,

Shiraki Tomohiro,

Kakimoto Hidenobu,

Gotou Osamu,

Yamada Takeshi,

Okumoto Kenji,

Nakatani Shuhei,

Sakanoue Kei,

Shinkai Seiji

Publication year - 2012

Publication title -

advanced materials

Language(s) - English

Resource type - Journals

SCImago Journal Rank - 10.707

H-Index - 527

eISSN - 1521-4095

pISSN - 0935-9648

DOI - 10.1002/adma.201104277

Subject(s) - wetting , materials science , monolayer , inkjet printing , irradiation , self assembled monolayer , photochemistry , contact angle , cleavage (geology) , nanotechnology , chemical engineering , low energy , optoelectronics , inkwell , composite material , chemistry , physics , fracture (geology) , nuclear physics , engineering , atomic physics

Wettability tuning for organic solvents is demonstrated with the “combination method”, a reversal of the conventional “cleavage method”. Several advantages are inherent to this method: for example, the syntheses are simple, various surface‐active groups can be used, and the reaction proceeds with a low‐energy light source. The image shows the result after UV irradiation through a patterning mask.

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