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Fine Wettability Control Created by a Photochemical Combination Method for Inkjet Printing on Self‐Assembled Monolayers
Author(s) -
Tsuchiya Youichi,
Haraguchi Shuichi,
Ogawa Masashi,
Shiraki Tomohiro,
Kakimoto Hidenobu,
Gotou Osamu,
Yamada Takeshi,
Okumoto Kenji,
Nakatani Shuhei,
Sakanoue Kei,
Shinkai Seiji
Publication year - 2012
Publication title -
advanced materials
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 10.707
H-Index - 527
eISSN - 1521-4095
pISSN - 0935-9648
DOI - 10.1002/adma.201104277
Subject(s) - wetting , materials science , monolayer , inkjet printing , irradiation , self assembled monolayer , photochemistry , contact angle , cleavage (geology) , nanotechnology , chemical engineering , low energy , optoelectronics , inkwell , composite material , chemistry , physics , fracture (geology) , nuclear physics , engineering , atomic physics
Wettability tuning for organic solvents is demonstrated with the “combination method”, a reversal of the conventional “cleavage method”. Several advantages are inherent to this method: for example, the syntheses are simple, various surface‐active groups can be used, and the reaction proceeds with a low‐energy light source. The image shows the result after UV irradiation through a patterning mask.