Premium
Chiral Nematic Fluids as Masks for Lithography
Author(s) -
Jeong Hyeon Su,
Kim Yun Ho,
Lee Ji Sun,
Kim Jung Hyun,
Srinivasarao Mohan,
Jung HeeTae
Publication year - 2012
Publication title -
advanced materials
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 10.707
H-Index - 527
eISSN - 1521-4095
pISSN - 0935-9648
DOI - 10.1002/adma.201103817
Subject(s) - materials science , photoresist , photolithography , liquid crystal , lithography , optics , electric field , optoelectronics , photomask , polarization (electrochemistry) , resist , nanotechnology , chemistry , physics , layer (electronics) , quantum mechanics
A lithographic scheme is reported that uses a cholesteric liquid crystal with its helical axis in the plane of the sample as a “mask” for imprinting patterns in a photoresist over a large area. On the application of an electric field the cholesteric liquid crystals produce a texture that acts as a lattice of cylindrical lenses for one polarization of a light beam. This is used in photolithography to create parallel lines over large areas.