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Photoresponsive Block Copolymer Photonic Gels with Widely Tunable Photosensitivity by Counter‐Ions
Author(s) -
Ahn Youshin,
Kim Eunjoo,
Hyon Jinho,
Kang Changjoon,
Kang Youngjong
Publication year - 2012
Publication title -
advanced materials
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 10.707
H-Index - 527
eISSN - 1521-4095
pISSN - 0935-9648
DOI - 10.1002/adma.201103767
Subject(s) - photosensitivity , materials science , photolithography , copolymer , photonics , optoelectronics , ion , self healing hydrogels , photonic crystal , block (permutation group theory) , polymer , polymer chemistry , chemistry , composite material , organic chemistry , geometry , mathematics
Block copolymer photonic crystals comprising polyelectrolyte hydrogels exhibit strong reflective multicolors in response to near‐UV radiation. Due to unique volume transition of swollen gels, the photonic gels show high photosensitivity, and which can be widely tunable by exchanging counter‐anions. Multicolor photonic patterns created by photolithography can be repeatedly fixated and reactivated by sequentially exchanging counter‐anions with different photosensitivity.