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Two‐Photon Continuous Flow Lithography
Author(s) -
Laza Simona C.,
Polo Marco,
Neves Antonio A. R.,
Cingolani Roberto,
Camposeo Andrea,
Pisignano Dario
Publication year - 2012
Publication title -
advanced materials
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 10.707
H-Index - 527
eISSN - 1521-4095
pISSN - 0935-9648
DOI - 10.1002/adma.201103357
Subject(s) - materials science , lithography , microfluidics , nanotechnology , next generation lithography , x ray lithography , extreme ultraviolet lithography , photon , surface roughness , computational lithography , optics , maskless lithography , two photon excitation microscopy , electron beam lithography , optoelectronics , resist , composite material , physics , layer (electronics) , fluorescence
A new approach for microfluidics‐based production of polymeric particles , namely two‐photon continuous flow lithography, is reported. This technique takes advantage of two‐photon lithography to create objects with sub‐micrometer and 3D features, and overcomes the traditional process limitations of two‐photon lithography by using multiple beam production under continuous flow. Polymeric fibers, helical and bow‐tie particles with sub‐diffraction resolution and surface roughness as low as 10 nm are demonstrated.