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A Versatile Nanopatterning Technique Based on Controlled Undercutting and Liftoff
Author(s) -
Rosamond Mark C.,
Gallant Andrew J.,
Petty Michael C.,
Kolosov Oleg,
Zeze Dagou A.
Publication year - 2011
Publication title -
advanced materials
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 10.707
H-Index - 527
eISSN - 1521-4095
pISSN - 0935-9648
DOI - 10.1002/adma.201102708
Subject(s) - materials science , nanotechnology , microfabrication , fabrication , nanolithography , nanowire , wafer , etching (microfabrication) , medicine , alternative medicine , pathology , layer (electronics)
A new low‐cost top‐down nanolithography technique based on controlled undercutting and liftoff is reported. The method is applicable to a wide selection of inorganic materials (those that can be patterned by dry etching or lift‐off) and can create 100‐nm sized structures over wafer‐sized areas. The method requires only conventional microfabrication processes and is ideal for producing nanowires, rings, and dots. A proof‐of‐concept experiment is also described for the fabrication of gold‐nanowire transparent conducting electrodes, which show excellent optoelectronic properties.