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Continuous Patterning of Nanogratings by Nanochannel‐Guided Lithography on Liquid Resists
Author(s) -
Ok Jong G.,
Park Hui Joon,
Kwak Moon Kyu,
PinaHernandez Carlos A.,
Ahn Se Hyun,
Guo L. Jay
Publication year - 2011
Publication title -
advanced materials
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 10.707
H-Index - 527
eISSN - 1521-4095
pISSN - 0935-9648
DOI - 10.1002/adma.201102199
Subject(s) - resist , materials science , lithography , nanotechnology , substrate (aquarium) , fabrication , wetting , coating , nanolithography , nanoimprint lithography , grating , optoelectronics , composite material , layer (electronics) , medicine , alternative medicine , pathology , oceanography , geology
A nanochannel‐guided lithography technique is developed that achieves continuous fabrication of higher aspect‐ratio nanograting structures by adopting a cross‐linkable liquid resist coating. Under the guidance of nanochannels in the grating mold, the UV‐curable liquid resist is smoothly extruded and self‐stabilized along the slightly inscribed solid substrate, dictated by the resist wettability to the substrate as well as the substrate topography.