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Light Emission from Nanocrystalline Si Inverse Opals and Controlled Passivation by Atomic Layer Deposited Al 2 O 3
Author(s) -
GallegoGómez Francisco,
Ibisate Marta,
Golmayo Dolores,
Palomares F. Javier,
Herrera Miriam,
Hernández Jesús,
Molina Sergio I.,
Blanco Álvaro,
López Cefe
Publication year - 2011
Publication title -
advanced materials
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 10.707
H-Index - 527
eISSN - 1521-4095
pISSN - 0935-9648
DOI - 10.1002/adma.201101797
Subject(s) - materials science , photoluminescence , nanocrystalline material , passivation , nanocrystal , atomic layer deposition , photoexcitation , silicon , optoelectronics , light emission , layer (electronics) , nanotechnology , deposition (geology) , excited state , atomic physics , paleontology , physics , sediment , biology
3D‐nanostructured ensembles of silicon nanocrystals forming inverse opals , directly prepared by magnesioreduction, exhibited intense photoluminescence in a broadband range (visible and NIR). Light emission, which strongly diminished under photoexcitation, was preserved by engineering the nanocrystals interface with atomic layer deposition of alumina. The high accessibility of the nanocrystals throughout the self‐supported structure was a key factor for efficient photoluminescence stabilization.