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Mechanophotopatterning on a Photoresponsive Elastomer
Author(s) -
Kloxin Christopher J.,
Scott Timothy F.,
Park Hee Young,
Bowman Christopher N.
Publication year - 2011
Publication title -
advanced materials
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 10.707
H-Index - 527
eISSN - 1521-4095
pISSN - 0935-9648
DOI - 10.1002/adma.201100323
Subject(s) - elastomer , materials science , polymer science , irradiation , composite material , nanotechnology , physics , nuclear physics
Photopatterning of a photoreversible covalent elastomeric network under mechanical strain , or mechanophotopatterning, provides a facile approach to fabricate complex topographical features using elementary irradiation schemes. A photoresponsive material is deformed in two dimensions and irradiated through a mask, resulting in a transparent material with topography that reflects the concentric rings of the mask.