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Non‐Reflecting Surfaces: Non‐Reflecting Silicon and Polymer Surfaces by Plasma Etching and Replication (Adv. Mater. 1/2011)
Author(s) -
Sainiemi Lauri,
Jokinen Ville,
Shah Ali,
Shpak Maksim,
Aura Susanna,
Suvanto Pia,
Franssila Sami
Publication year - 2011
Publication title -
advanced materials
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 10.707
H-Index - 527
eISSN - 1521-4095
pISSN - 0935-9648
DOI - 10.1002/adma.201090164
Subject(s) - prism , materials science , etching (microfabrication) , reflection (computer programming) , replication (statistics) , silicon , optics , plasma etching , fabrication , total internal reflection , optoelectronics , polymer , nanotechnology , composite material , layer (electronics) , physics , computer science , medicine , statistics , mathematics , alternative medicine , pathology , programming language
On the cover, a beam of broadband light hits a prism. Instead of typical dispersion and reflection from the prism, the reflection is almost totally suppressed and the light can be absorbed by the material of the prism if the surface has adequate nanotexture. The article on p. 122 by Lauri Sainiemi and co‐workers describes a high throughput and low‐cost method for fabrication of such nanostructured, non‐reflection silicon and polymer surfaces by plasma etching and replication.