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Probe Lithography: Probe‐Based 3‐D Nanolithography Using Self‐Amplified Depolymerization Polymers (Adv. Mater. 31/2010)
Author(s) -
Knoll Armin W.,
Pires David,
Coulembier Olivier,
Dubois Philippe,
Hedrick James L.,
Frommer Jane,
Duerig Urs
Publication year - 2010
Publication title -
advanced materials
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 10.707
H-Index - 527
eISSN - 1521-4095
pISSN - 0935-9648
DOI - 10.1002/adma.201090103
Subject(s) - materials science , nanolithography , lithography , polymer , depolymerization , nanotechnology , dip pen nanolithography , electron beam lithography , photolithography , next generation lithography , optoelectronics , resist , optics , fabrication , composite material , polymer chemistry , medicine , alternative medicine , physics , pathology , layer (electronics)
Using a heated probe tip a 3D relief replica of the world map with feature sizes as small as 40 nm has been created in a 250 nm thick phthalaldehyde polymer film. The relief structures are created by local evaporation of the polymeric material which decomposes spontaneously into its monomer units upon applying a heat stimulus of microsecond duration. The work, reported on p. 3361 by Armin Knoll, Urs Dürig, and co‐workers, opens up new perspectives for probe lithography approaching patterning speeds comparable to electron beam lithography at similar resolution.