Premium
Low‐Power High‐Performance Non‐Volatile Memory on a Flexible Substrate with Excellent Endurance
Author(s) -
Cheng ChunHu,
Yeh FonShan,
Chin Albert
Publication year - 2011
Publication title -
advanced materials
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 10.707
H-Index - 527
eISSN - 1521-4095
pISSN - 0935-9648
DOI - 10.1002/adma.201002946
Subject(s) - materials science , non volatile memory , resistive random access memory , substrate (aquarium) , dielectric , optoelectronics , reset (finance) , data retention , high κ dielectric , electrode , oceanography , financial economics , economics , geology , chemistry
Very high performance Ni/GeO x /HfON/TaN non‐volatile resistive memory is fabricated using the covalently bonded dielectric GeO x and metal oxynitride HfON as well as low cost electrodes. The device shows low set and reset powers, good 85 °C retention, and 10 5 endurance, which are near to the characteristics of existing commercial flash memory.
Accelerating Research
Robert Robinson Avenue,
Oxford Science Park, Oxford
OX4 4GP, United Kingdom
Address
John Eccles HouseRobert Robinson Avenue,
Oxford Science Park, Oxford
OX4 4GP, United Kingdom