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Extrinsic Corrugation‐Assisted Mechanical Exfoliation of Monolayer Graphene
Author(s) -
Pang Shuping,
Englert Jan M.,
Tsao Hoi Nok,
Hernandez Yenny,
Hirsch Andreas,
Feng Xinliang,
Müllen Klaus
Publication year - 2010
Publication title -
advanced materials
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 10.707
H-Index - 527
eISSN - 1521-4095
pISSN - 0935-9648
DOI - 10.1002/adma.201002872
Subject(s) - exfoliation joint , graphene , monolayer , materials science , nanotechnology , silicon , scalability , optoelectronics , computer science , database
An extrinsic corrugation‐assisted mechanical exfoliation process is introduced to fabricate ultra‐large, patterned monolayer graphene on silicon substrates. This exfoliation method, without any contamination, offers not only an ideal alternative for the scalable deposition of monolayer graphene on silicon substrates, but also provides a promising basis for the construction of graphene‐based integrated circuits.