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Advancing MIM Electronics: Amorphous Metal Electrodes
Author(s) -
Cowell E. William,
Alimardani Nasir,
Knutson Christopher C.,
Conley John F.,
Keszler Douglas A.,
Gibbons Brady J.,
Wager John F.
Publication year - 2011
Publication title -
advanced materials
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 10.707
H-Index - 527
eISSN - 1521-4095
pISSN - 0935-9648
DOI - 10.1002/adma.201002678
Subject(s) - materials science , quantum tunnelling , amorphous solid , electrode , metal insulator metal , metal , dielectric , nanotechnology , optoelectronics , insulator (electricity) , electronics , realization (probability) , electrical engineering , capacitor , metallurgy , statistics , mathematics , organic chemistry , voltage , chemistry , engineering
Amorphous metal thin films with atomically smooth surfaces are employed as contact layers for the realization of metal‐insulator‐metal (MIM) devices operating on the basis of controlled quantum mechanical tunneling through an ultrathin dielectric.