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Photoresist Templates for Wafer‐Scale Defect‐Free Evaporative Lithography
Author(s) -
Tang Xiaosong,
O’Shea Sean J.,
Vakarelski Ivan U.
Publication year - 2010
Publication title -
advanced materials
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 10.707
H-Index - 527
eISSN - 1521-4095
pISSN - 0935-9648
DOI - 10.1002/adma.201002644
Subject(s) - photoresist , template , photolithography , wafer , materials science , lithography , nanotechnology , nanoscopic scale , scale (ratio) , optoelectronics , layer (electronics) , physics , quantum mechanics
A highly efficient evaporative lithography method for wafer‐scale patterning of microwire networks is introduced. The method is based on the use of a photolithography defined photoresist as the template for the evaporative self‐assembly of nanoparticles contained in liquid suspensions. An example application is given showing the patterning of conducting‐transparent microwire coating composed of gold nanoparticles that outperform standard ITO coatings.