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Non‐Reflecting Silicon and Polymer Surfaces by Plasma Etching and Replication
Author(s) -
Sainiemi Lauri,
Jokinen Ville,
Shah Ali,
Shpak Maksim,
Aura Susanna,
Suvanto Pia,
Franssila Sami
Publication year - 2011
Publication title -
advanced materials
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 10.707
H-Index - 527
eISSN - 1521-4095
pISSN - 0935-9648
DOI - 10.1002/adma.201001810
Subject(s) - materials science , wafer , replication (statistics) , etching (microfabrication) , silicon , plasma etching , polymer , plasma , reflection (computer programming) , reactive ion etching , nanotechnology , casting , optoelectronics , composite material , statistics , mathematics , physics , layer (electronics) , quantum mechanics , computer science , programming language
Maskless plasma etching forms nanospikes on a silicon wafer. The inverse of the nanospike pattern is replicated into a poly(dimethylsiloxane) (PDMS) film by casting. The PDMS functions as a stamp for replicating the original pattern into polymeric substrates. All nanospike‐structured surfaces suppress light reflection and can be made self‐cleaning.