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Holographic Design and Fabrication of Diamond Symmetry Photonic Crystals Via Dual‐Beam Quadruple Exposure
Author(s) -
Liang Guanquan,
Zhu Xuelian,
Xu Yongan,
Li Jie,
Yang Shu
Publication year - 2010
Publication title -
advanced materials
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 10.707
H-Index - 527
eISSN - 1521-4095
pISSN - 0935-9648
DOI - 10.1002/adma.201001785
Subject(s) - fabrication , holography , diamond , materials science , photonic crystal , photoresist , lithography , diamond cubic , lattice (music) , photonics , symmetry (geometry) , optoelectronics , optics , nanotechnology , composite material , physics , geometry , medicine , alternative medicine , mathematics , pathology , layer (electronics) , acoustics
Diamond symmetry structures (space group No. 227) with tunable lattice size are fabricated from epoxy‐functionalized cyclohexyl polyhedral oligomeric silsesquioxane (POSS) by holographic lithography using dual‐beam quadruple exposure configuration with careful consideration of the relative phase shift, wobble effect, and pre‐compensation of the photoresist shrinkage. Calculation suggests that Si photonic crystals templated from the POSS structures, both directly converted and its inverse structure, offer the same and maximum complete PBGs in comparison to other holographically patterned diamond lattices. Holographic Design and Fabrication of Diamond Symmetry Photonic Crystals Via Dual‐Beam Quadruple Exposure