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Nano‐tailoring the Surface Structure for the Monolithic High‐Performance Antireflection Polymer Film
Author(s) -
Choi Kiwoon,
Park Sung Ho,
Song Young Min,
Lee Yong Tak,
Hwangbo Chang Kwon,
Yang Hoichang,
Lee Han Sup
Publication year - 2010
Publication title -
advanced materials
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 10.707
H-Index - 527
eISSN - 1521-4095
pISSN - 0935-9648
DOI - 10.1002/adma.201001678
Subject(s) - materials science , anti reflective coating , nano , polymer , reflectivity , optoelectronics , range (aeronautics) , optics , nanotechnology , composite material , layer (electronics) , physics
Nano‐tailoring the shape and dimensions of the parabolic antireflective structure predicted by simulation has been successfully carried out to fabricate monolithic high‐performance antireflection (AR) polymer films. The average total reflectivity from an artificial antireflection film is lowered down to 0.64% at a wavelength range of 400 nm to 800 nm, which appears to be the best antireflection performance ever reported for transparent polymer antireflection films.