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Graphoepitaxial Assembly of Symmetric Block Copolymers on Weakly Preferential Substrates
Author(s) -
Han Eungnak,
Kang Huiman,
Liu ChiChun,
Nealey Paul F.,
Gopalan Padma
Publication year - 2010
Publication title -
advanced materials
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 10.707
H-Index - 527
eISSN - 1521-4095
pISSN - 0935-9648
DOI - 10.1002/adma.201001669
Subject(s) - copolymer , materials science , perpendicular , domain (mathematical analysis) , orientation (vector space) , block (permutation group theory) , content (measure theory) , crystallography , nanotechnology , polymer science , combinatorics , composite material , polymer , chemistry , geometry , mathematics , mathematical analysis
Weakly preferential substrates were utilized in a single step process to direct the assembly of symmetric PS‐ b ‐PMMA. The thickness dependence of domain orientation on weakly preferential substrates was exploited to dictate the lateral ordering of perpendicular lamellae.