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Silicon Pillars: Ultrahigh‐Crystalline‐Quality Silicon Pillars Formed by Millimeter‐Wave Annealing of Amorphous Silicon on Glass (Adv. Mater. 29/2009)
Author(s) -
Liu Fude,
Jones Kim M.,
Xu Yueqin,
Nemeth William,
Lohr John,
Neilson Jeff,
Romero Manuel J.,
AlJassim Mowafak M.,
Young David L.
Publication year - 2009
Publication title -
advanced materials
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 10.707
H-Index - 527
eISSN - 1521-4095
pISSN - 0935-9648
DOI - 10.1002/adma.200990110
Subject(s) - materials science , silicon , amorphous silicon , annealing (glass) , nanocrystalline silicon , chemical vapor deposition , amorphous solid , millisecond , silicon monoxide , optoelectronics , crystalline silicon , optics , composite material , crystallography , chemistry , physics , astronomy
Unique, three‐dimensional structures—silicon pillars—are formed by millisecond long, single‐pulse annealing of 110‐GHz millimeter‐wave radiation incident upon intrinsic amorphous silicon (a‐Si) thin films deposited on glass by hot‐wire chemical vapor deposition (HWCVD), as demonstrated by Fude Liu and co‐workers on p. 3002 . The cover shows a field‐emission secondary‐electron microscopy (FE‐SEM) image of silicon pillars taken at a sample tilt angle of 52°.