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Block Copolymer Nanostructures: Nanoscopic Morphologies in Block Copolymer Nanorods as Templates for Atomic‐Layer Deposition of Semiconductors (Adv. Mater. 27/2009)
Author(s) -
Wang Yong,
Qin Yong,
Berger Andreas,
Yau Eric,
He Changcheng,
Zhang Lianbing,
Gösele Ulrich,
Knez Mato,
Steinhart Martin
Publication year - 2009
Publication title -
advanced materials
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 10.707
H-Index - 527
eISSN - 1521-4095
pISSN - 0935-9648
DOI - 10.1002/adma.200990103
Subject(s) - nanorod , copolymer , materials science , nanoscopic scale , nanostructure , template , nanotechnology , semiconductor , layer (electronics) , atomic layer deposition , polymer , optoelectronics , composite material
The frontispiece shows a TEM image of block copolymer nanorods exhibiting nanoscopic domain structures visualized by selective staining. The insets represent the methodology for producing semiconductor nanostructures reported by Yong Wang, Martin Steinhart, and co‐workers on p. 2763 . The first panel shows block copolymer nanorods, the second, the nanorods after conversion of the nanoscopic domain structure into a mesopore structure, and the third, the complex 1D semiconductor nanostructures obtained by ALD using the mesopores as templates.