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Nanoscale Conducting Oxide Writing: Nanoscale Writing of Transparent Conducting Oxide Features with a Focused Ion Beam (Adv. Mater. 6/2009)
Author(s) -
Sosa Norma E.,
Liu Jun,
Chen Christopher,
Marks Tobin J.,
Hersam Mark C.
Publication year - 2009
Publication title -
advanced materials
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 10.707
H-Index - 527
eISSN - 1521-4095
pISSN - 0935-9648
DOI - 10.1002/adma.200990017
Subject(s) - materials science , nanoscopic scale , nanowire , oxide , focused ion beam , nanotechnology , substrate (aquarium) , transparent conducting film , ion beam , electrical conductor , optoelectronics , indium tin oxide , ion , beam (structure) , optics , thin film , composite material , oceanography , physics , quantum mechanics , geology , metallurgy
A conductive atomic force microscopy tip probes an embedded, optically transparent, electrically conducting oxide nanowire that was patterned on an indium oxide substrate using focused ion beam implantation. The nanowire is 160 nm wide, 7 nm deep, and theoretically limitless in length, connectivity, and shape. Nanowires of this type have potential application as interconnects in transparent electronics. Further details can be found in the article by Tobin Marks, Mark Hersam and co‐workers on p.721 .