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Determination of Electronic Structure of Oxide–Oxide Interfaces by Photoemission Spectroscopy
Author(s) -
Wang HuiQiong,
Altman Eric,
Broadbridge Christine,
Zhu Yimei,
Henrich Victor
Publication year - 2010
Publication title -
advanced materials
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 10.707
H-Index - 527
eISSN - 1521-4095
pISSN - 0935-9648
DOI - 10.1002/adma.200903759
Subject(s) - overlayer , materials science , oxide , monolayer , substrate (aquarium) , electronic structure , spectral line , photoemission spectroscopy , spectroscopy , metal , non blocking i/o , density of states , chemical physics , analytical chemistry (journal) , crystallography , condensed matter physics , nanotechnology , chemistry , metallurgy , biochemistry , oceanography , physics , catalysis , chromatography , quantum mechanics , astronomy , geology
A method has been developed to use the finite escape depth of the photoelectrons emitted in ultraviolet photoemission spectroscopy (UPS) to determine the electronic density‐of‐states at the interface between two dissimilar metal oxides. Ultrathin films of one oxide are grown heteroepitaxially, one monolayer at a time, on a single‐crystal substrate of the other oxide, and UPS spectra are taken after each complete monolayer. By comparing experimental UPS spectra with calculated spectra based on specific models of the interfacial structure, the interfacial density‐of‐states can be extracted. The two oxide systems studied here are NiO–Fe 3 O 4 and CoO–Fe 3 O 4 . The former system is found to have an atomically abrupt interface, with no significant density of interface states. For CoO, however, an interfacial electronic spectrum, different from that of either the substrate or the overlayer, is found. The spatial extent and possible origin of those interfacial states is discussed.